INFLUENCE OF DEPUTIES ON RADICAL COPOLIMERIZATION P-PHENYL-SUBSTITUTED CYCLOPROPYL METHACRYLATES WITH STYRENE

Abstract

The radical copolymerization of p-phenyl-substituted cyclopropylmethacrylates with styrene was carried out, the composition and structure of the obtained copolymers were established. The values of the constants of the relative activity of the monomers were determined and the Q-e parameters were calculated according to Alfrey Price. The photosensitivity of these copolymers was studied. Photochemical structuring was studied and it was found that the synthesized copolymers are photosensitive (48 cm2 /J) and they can be used to create a new photosensitive material.